Reactive Sputtering of NiCr Resistors With Closely Adjustable Temperature Coefficient of Resistance
نویسندگان
چکیده
منابع مشابه
Developments of the Physical and Electrical Properties of NiCr and NiCrSi Single-Layer and Bi-Layer Nano-Scale Thin-Film Resistors
In this study, commercial-grade NiCr (80 wt % Ni, 20 wt % Cr) and NiCrSi (55 wt % Ni, 40 wt % Cr, 5 wt % Si) were used as targets and the sputtering method was used to deposit NiCr and NiCrSi thin films on Al₂O₃ and Si substrates at room temperature under different deposition time. X-ray diffraction patterns showed that the NiCr and NiCrSi thin films were amorphous phase, and the field-effect s...
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ژورنال
عنوان ژورنال: ElectroComponent Science and Technology
سال: 1977
ISSN: 0305-3091
DOI: 10.1155/apec.4.133